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| Customization: | Available |
|---|---|
| After-sales Service: | Onlin |
| Warranty: | 1 |
The Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. Fully compliant with CE criteria, it is widely utilized in micro-electronics, nano-materials, optical films, and solar batteries.
| Wafer Dimension | 8 inch and below |
| Wafer temperature | RT-400ºC, Precision ±0.1ºC |
| Number of precursor | Three lines (Optional more) |
| ALD Valve | Swagelok ALD swift valve |
| Background vacuum | <5*10-3 Torr |
| Growing mode | Consecutive or interval deposition |
| Power supply | 50-60Hz, 220V/20A AC |
| Heterogeneity | <±1% |
| Instrument Dimension | 600mm x 600mm x 1100mm |








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