Marin-one Medical
1 / 4
The three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets available. Customers can choose the target according to the size of the substrate to be coated.
Key Capabilities:
Applications: This device is ideal for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and PTFE films. It is an ideal equipment for material film preparation in laboratories due to its small size and easy operation.
| Sample Stage | Size | φ185mm | Temp Accuracy | ±1ºC |
| Max Heating | Max 500ºC | Rotate Speed | 1-20rpm adjustable | |
| Sputtering Head | Quantity | 2" × 3 (1", 2" optional) | Water Chiller | Flow rate of 10L/min |
| Cooling Mode | Water cooling | - | - | |
| Vacuum Chamber | Chamber Size | φ300mm × 300mm | Watch Window | φ100mm |
| Material | Stainless steel | Opening Mode | Top cover open | |
| Flowmeter | Channels | 2 channels; measuring range 100sccm (customizable) | ||
| Vacuum System | Molecular Pump | CY-600 | Ultimate Vacuum | 1.0E-5Pa |
| Backing Pump | Rotary vane pump | Measurement | Compound vacuum gauge | |
| Pumping Rate | Vacuum up to 1.0E-3Pa in 20 minutes | |||
| Power Supply | AC 220V 50/60Hz | |||
| Power Config | RF Supply | 3 x 300W | Total Power | 2.5KW |
Specializing in the development and production of laboratory technology research equipment since 2005. Our products cover mixing, pressing, burning, cutting, grinding, polishing, and coating analytical equipment. Serving scientific research in labs of universities and colleges worldwide.
