Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year

Product Description

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Basic Information

Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Weight (Kg)
4000
Dimension
Customized Size
Key Selling Points
Automatic
Technology
Physical Vapor Deposition
Method of Coating
Magnetron Sputtering
Chamber Size
Customized
Kinds of Film
Functional Coatings

Product Description

Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

The equipment features a reasonable structure, providing uniform coating with high quality. It boasts fast pumping speeds, short cycles, high efficiency, and stable performance with low energy consumption. It is widely used in automotive, audio, small appliances, computers, watches, toys, cell phones, reflective cups, and cosmetics industries.

DC magnetron sputtering coating machine is typically used for direct sputtering coating on various substrates including plastic, glass, metal, and ceramics.

DC Magnetron Sputtering

We have dedicated more than 10 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, manufactured to fit most magnetron sizes.

Magnetic fields essentially define the behavior and properties of the ion-charged particles used for sputtering. Advanced modeling of magnetron sputtering enhances productivity, applicability, and reproducibility.

Technical Specifications
Model Number SP-1000 SP-1200 SP-1400 SP-1800
Chamber Dimension (D*H) 1000*1100 1200*1400 1400*1600 1800*2000
Chamber Material Carbon steel, SUS304 or SUS316L
Sputtering Cathodes ≥1 sets, DC sputtering system, cylindrical or rectangle
Pumping Time Atmosphere to 5.0*10-2Pa < 8 minutes
Ultimate Vacuum 5.0*10-4 Pa
Working Mode Automatic or Manual mode via PLC touch screen
System Diagram

Necessary Components & Parts

  • Vacuum pumps
  • DC sputtering cathode with power supplies
  • Unbalanced sputtering cathode with power supplies
  • O rings & Magnetic valves
  • Vacuum meter with gauges/sensors
  • Bias power supply
  • MFC (Mass Flow Controllers)
  • Target materials
  • Customized jigs
Parts Display
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MF Sputtering Information

Production Details
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Frequently Asked Questions

Q1: What industries can use this Magnetron Sputtering System?
A1: It is widely used in automotive parts, audio equipment, small appliances, computer components, watches, toys, mobile phones, and cosmetic packaging.
Q2: What types of substrates are compatible with this equipment?
A2: The system is designed for a variety of substrates including various plastics, glass, metals, and ceramic materials.
Q3: Is the operation of the sputtering system automated?
A3: Yes, the system supports both Automatic and Manual modes, controlled via a 10.4 or 15-inch PLC touch screen for easy operation.
Q4: Can the vacuum chamber size be customized?
A4: Absolutely. All specifications, including the size of the vacuum chamber, quantity of sputtering cathodes, and pump configurations, can be customized based on specific requests.
Q5: How long does the pumping process take?
A5: The system can achieve a vacuum level from atmosphere to 5.0*10-2Pa in less than 8 minutes, ensuring high production efficiency.
Q6: What kinds of sputtering power sources are available?
A6: The system supports various power sources including HiPIMS, DC, MF, and RF depending on your coating requirements.

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